Synopsys Conference Presentations Spotlight

Presentations


Advanced device extraction and LVS (layout vs. schematic) with pattern matching applications
27 February 2024 • 3:50 PM - 4:10 PM PST | Convention Center, Room 210C

Application-driven optimizations of metal stack and PDN (power delivery network) using machine learning framework
27 February 2024 • 4:10 PM - 4:30 PM PST | Convention Center, Room 210C

Metalens manufacturing complexities and costs
27 February 2024 • 5:50 PM - 6:10 PM PST | Convention Center, Room 211B

Machine learning assisted OPC model setup
28 February 2024 • 5:30 PM - 7:00 PM PST | Convention Center, Hall 2

High accuracy electromagnetic full-chip modeling for curvilinear mask OPC and ILT
28 February 2024 • 3:05 PM - 3:25 PM PST | Convention Center, Room 210C

Advances in full-chip three-dimensional resist modeling for low k1 EUV and DUV lithography
29 February 2024 • 8:40 AM - 9:00 AM PST | Convention Center, Room 210C

Full-field correction for stitched double exposure high-NA EUVL processes
29 February 2024 • 10:10 AM - 10:35 PM PST | Convention Center, Room 210C

Advanced simulations using an improved metal oxide photoresist model
29 February 2024 • 10:50 AM - 11:10 AM PST | Convention Center, Room 220C

Computational lithography for anti-spacer multipatterning
29 February 2024 • 11:50 AM - 12:10 PM PST | Convention Center, Room 220C

Advancing the curvilinear ILT and OPC ecosystem for low-k1 DUV and EUV lithography
29 February 2024 • 2:55 PM - 3:20 PM PST | Convention Center, Room 210C

Simulating use of displacement talbot lithography for high volume AR waveguide manufacturing
29 February 2024 • 3:20 PM - 3:45 PM PST | Convention Center, Room 210C