Monday, February 26, 2024
2:45 p.m. - 3:15 p.m. PT
With the evolution of semiconductor technology, an increasing number of RET tools have been developed to improve the imaging and quality of patterns. Winbond has closely collaborated with Synopsys in recent years, achieving notable results. First, a Hybrid ILT Solution was developed with Synopsys, combining Manhattan and curve linear patterns to achieve an optimal balance between mask write time and quality. Second, with Synopsys' TOPILT solution, optimal-sized dummy patterns were successfully added around critical patterns, significantly enhancing the process window. Third, due to the precise predictability of Slitho, a collaboration with Synopsys integrated the Slitho model with SNPS's ILT/OPC tools. This integration successfully predicted the CD size of unfriendly patterns, substantially improving the CD range.