Cloud native EDA tools & pre-optimized hardware platforms
Synopsys SPIE Lithography Technical Forum 2023
On-Demand
If you missed attending the event live, register below to watch the presentations on-demand.
Keynote: The Brave New World of Multi-Node Mask Making
Chris Progler, Chief Technology Officer, Photronics Inc
EUV Lithography Patterning: Status and Challenges Towards
High NA
Danilo DeSimone, Principal Member of Technical Staff, IMEC
Curvilinear Mask Solutions for EUV Lithography Enablement
Thuc Dam, Sr. Product Engineering Mgr., Synopsys
Please visit our sessions and posters page to learn more about Synopsys at SPIE Advanced Lithography + Patterning 2023