The Synopsys Technical Forum provides OPC, RET, and MDP engineers and managers practical insight into upcoming industry trends and solutions for delivering the highest quality results from their lithography hardware.


If you missed attending the event live, register below to watch the presentations on-demand.


Keynote: The Brave New World of Multi-Node Mask Making
Chris Progler, Chief Technology Officer, Photronics Inc

EUV Lithography Patterning: ​Status and Challenges Towards
High NA
Danilo DeSimone, Principal Member of Technical Staff, IMEC

Curvilinear Mask Solutions for ​EUV Lithography Enablement
Thuc Dam​, Sr. Product Engineering Mgr., Synopsys


Please visit our sessions and posters page to learn more about Synopsys at SPIE Advanced Lithography + Patterning 2023

Synopsys Presentations & Posters

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