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Synopsys @ SPIE Advanced Lithography + Patterning 2023

February 26 - March 2, 2023

San Jose Convention Center

Synopsys Sessions & Poster Spotlight

Presentations

Full chip ILT mask synthesis for advanced memory manufacturing
27 February 2023 • 10:30 AM - 10:50 AM PST | Convention Center, Room 210A

Abstract

Curvilinear mask handling in OPC flow
27 February 2023 • 11:10 AM - 11:30 AM PST | Convention Center, Room 210A

Abstract

Improving OPC modeling accuracy with rigorous and compact modeling deformation effects in photoresists
27 February 2023 • 3:40 PM - 4:00 PM PST | Convention Center, Room 210A

Abstract

Evaluation of field stitching optimization for robust manufacturing with high-NA EUVL
27 February 2023 • 4:40 PM - 5:00 PM PST | Convention Center, Room 210A

Abstract

Verification methods for curvilinear and real-curve geometries
28 February 2023 • 3:10 PM - 3:40 PM PST | Convention Center, Room 210A

Abstract

Absorber material deficiency impact on a stochastically patterned wafer analyzed with a clustered model
1 March 2023 • 8:40 AM - 9:00 AM PST | Convention Center, Grand Ballroom 220A

Abstract

High accuracy OPC modeling for new EUV low-K1 mask technology options
1 March 2023 • 9:00 AM - 9:20 AM PST | Convention Center, Room 210A

Abstract

Modeling accuracy and TAT improvements for next generation mask error correction
1 March 2023 • 9:20 AM - 9:40 AM PST | Convention Center, Room 210A

Abstract

Computational patterning and process variation impact on photonics devices
1 March 2023 • 10:10 AM - 10:30 AM PST | Convention Center, Room 210C

Abstract

Electrical analysis of a stochastically simulated 2 nm node electrical test structure
1 March 2023 • 2:20 PM - 2:40 PM PST | Convention Center, Room 210A

Abstract

Scalable hierarchy extraction of repeating structures to enhance full chip mask synthesis
1 March 2023 • 2:40 PM - 3:00 PM PST | Convention Center, Room 210A

Abstract

A Synopsys TCAD-based workflow to support technology evaluation at 3nm and beyond
1 March 2023 • 4:10 PM - 4:30 PM PST | Convention Center, Room 210A

Abstract

Process optimization for next generation high-NA EUV patterning by computational lithography techniques
2 March 2023 • 9:20 AM - 9:40 AM PST | Convention Center, Grand Ballroom 220A

Abstract

Machine learning applications on 3nm node technology and designs for improving block-level PPA
2 March 2023 • 11:40 AM - 12:00 PM PST | Convention Center, Room 210A

Abstract

Automatic generation of representative and diversified pattern samples from a full chip layout
2 March 2023 • 12:00 PM - 12:20 PM PST | Convention Center, Room 210A

Abstract

Machine learning based inverse lithography technology for an advanced DRAM contact layer
2 March 2023 • 2:30 PM - 2:50 PM PST | Convention Center, Room 210A

Abstract

Poster

Mask absorber material or tone and process impact on resist line edge roughness
1 March 2023 • 5:30 PM - 7:00 PM PST | Convention Center, Hall 2

Abstract

Courses

Machine Learning for Lithography
26 February 2023 • 8:30 AM - 5:30 PM PST

Abstract

Synopsys @ SPIE Advanced Lithography + Patterning 2023

Synopsys Sessions & Poster Spotlight

Presentations

Full chip ILT mask synthesis for advanced memory manufacturing 27 February 2023 • 10:30 AM - 10:50 AM PST | Convention Center, Room 210A

Curvilinear mask handling in OPC flow 27 February 2023 • 11:10 AM - 11:30 AM PST | Convention Center, Room 210A

Improving OPC modeling accuracy with rigorous and compact modeling deformation effects in photoresists 27 February 2023 • 3:40 PM - 4:00 PM PST | Convention Center, Room 210A

Evaluation of field stitching optimization for robust manufacturing with high-NA EUVL 27 February 2023 • 4:40 PM - 5:00 PM PST | Convention Center, Room 210A

Verification methods for curvilinear and real-curve geometries 28 February 2023 • 3:10 PM - 3:40 PM PST | Convention Center, Room 210A

Absorber material deficiency impact on a stochastically patterned wafer analyzed with a clustered model 1 March 2023 • 8:40 AM - 9:00 AM PST | Convention Center, Grand Ballroom 220A

High accuracy OPC modeling for new EUV low-K1 mask technology options 1 March 2023 • 9:00 AM - 9:20 AM PST | Convention Center, Room 210A

Modeling accuracy and TAT improvements for next generation mask error correction 1 March 2023 • 9:20 AM - 9:40 AM PST | Convention Center, Room 210A

Computational patterning and process variation impact on photonics devices 1 March 2023 • 10:10 AM - 10:30 AM PST | Convention Center, Room 210C

Electrical analysis of a stochastically simulated 2 nm node electrical test structure 1 March 2023 • 2:20 PM - 2:40 PM PST | Convention Center, Room 210A

Scalable hierarchy extraction of repeating structures to enhance full chip mask synthesis 1 March 2023 • 2:40 PM - 3:00 PM PST | Convention Center, Room 210A

A Synopsys TCAD-based workflow to support technology evaluation at 3nm and beyond 1 March 2023 • 4:10 PM - 4:30 PM PST | Convention Center, Room 210A

Process optimization for next generation high-NA EUV patterning by computational lithography techniques 2 March 2023 • 9:20 AM - 9:40 AM PST | Convention Center, Grand Ballroom 220A

Machine learning applications on 3nm node technology and designs for improving block-level PPA 2 March 2023 • 11:40 AM - 12:00 PM PST | Convention Center, Room 210A

Automatic generation of representative and diversified pattern samples from a full chip layout 2 March 2023 • 12:00 PM - 12:20 PM PST | Convention Center, Room 210A

Machine learning based inverse lithography technology for an advanced DRAM contact layer 2 March 2023 • 2:30 PM - 2:50 PM PST | Convention Center, Room 210A

Poster

Mask absorber material or tone and process impact on resist line edge roughness 1 March 2023 • 5:30 PM - 7:00 PM PST | Convention Center, Hall 2

Courses

Machine Learning for Lithography 26 February 2023 • 8:30 AM - 5:30 PM PST

Full chip ILT mask synthesis for advanced memory manufacturing
27 February 2023 • 10:30 AM - 10:50 AM PST | Convention Center, Room 210A

Curvilinear mask handling in OPC flow
27 February 2023 • 11:10 AM - 11:30 AM PST | Convention Center, Room 210A

Improving OPC modeling accuracy with rigorous and compact modeling deformation effects in photoresists
27 February 2023 • 3:40 PM - 4:00 PM PST | Convention Center, Room 210A

Evaluation of field stitching optimization for robust manufacturing with high-NA EUVL
27 February 2023 • 4:40 PM - 5:00 PM PST | Convention Center, Room 210A

Verification methods for curvilinear and real-curve geometries
28 February 2023 • 3:10 PM - 3:40 PM PST | Convention Center, Room 210A

Absorber material deficiency impact on a stochastically patterned wafer analyzed with a clustered model
1 March 2023 • 8:40 AM - 9:00 AM PST | Convention Center, Grand Ballroom 220A

High accuracy OPC modeling for new EUV low-K1 mask technology options
1 March 2023 • 9:00 AM - 9:20 AM PST | Convention Center, Room 210A

Modeling accuracy and TAT improvements for next generation mask error correction
1 March 2023 • 9:20 AM - 9:40 AM PST | Convention Center, Room 210A

Computational patterning and process variation impact on photonics devices
1 March 2023 • 10:10 AM - 10:30 AM PST | Convention Center, Room 210C

Electrical analysis of a stochastically simulated 2 nm node electrical test structure
1 March 2023 • 2:20 PM - 2:40 PM PST | Convention Center, Room 210A

Scalable hierarchy extraction of repeating structures to enhance full chip mask synthesis
1 March 2023 • 2:40 PM - 3:00 PM PST | Convention Center, Room 210A

A Synopsys TCAD-based workflow to support technology evaluation at 3nm and beyond
1 March 2023 • 4:10 PM - 4:30 PM PST | Convention Center, Room 210A

Process optimization for next generation high-NA EUV patterning by computational lithography techniques
2 March 2023 • 9:20 AM - 9:40 AM PST | Convention Center, Grand Ballroom 220A

Machine learning applications on 3nm node technology and designs for improving block-level PPA
2 March 2023 • 11:40 AM - 12:00 PM PST | Convention Center, Room 210A

Automatic generation of representative and diversified pattern samples from a full chip layout
2 March 2023 • 12:00 PM - 12:20 PM PST | Convention Center, Room 210A

Machine learning based inverse lithography technology for an advanced DRAM contact layer
2 March 2023 • 2:30 PM - 2:50 PM PST | Convention Center, Room 210A

Mask absorber material or tone and process impact on resist line edge roughness
1 March 2023 • 5:30 PM - 7:00 PM PST | Convention Center, Hall 2

Machine Learning for Lithography
26 February 2023 • 8:30 AM - 5:30 PM PST