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Training & Education
Join us at SPIE Advanced Lithography + Patterning 2026 to experience the latest innovations shaping the future of semiconductor manufacturing. Interact with Synopsys experts and explore state-of-the-art solutions in mask synthesis, mask data preparation, and lithography simulation designed to address the industry’s most complex challenges.
Discover how AI and GPU acceleration are transforming computational lithography, and gain firsthand insights into how Synopsys empowers organizations to reach new levels of performance and efficiency in device fabrication.
Why Attend?
Take advantage of the opportunity to connect with our technical specialists and gain actionable strategies for innovation and operational excellence. Our conference sessions will provide a deeper understanding of how Synopsys’ comprehensive solutions can empower your organization to excel in device development and manufacturing.
Who Should Attend?
Our presentations are designed for engineers, technologists, and industry leaders seeking to remain at the forefront of lithography and semiconductor advancements. Whether your focus is process optimization, yield improvement, or next-generation device design, Synopsys offers the expertise and technologies to help you achieve your goals.
We look forward to connecting with you at SPIE 2026!
Synopsys at 2026 SPIE Advanced Lithography + Patterning
Synopsys Booth #611
Visit our booth on the exhibit floor to view the latest innovative technologies and chat with Synopsys experts live on February 24-25!