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Papers & Technical Presentations

Monday, February 23

Development methods for metal oxide photoresists: A fundamental investigation using lithography simulations

2:10 PM - 2:30 PM PST | Convention Center, Room 210C

Comparative simulation analysis of displacement Talbot lithography and DUV dry projection lithography for high-resolution periodic patterning

2:40 PM - 3:00 PM PST | Convention Center, Room 211B

Tuesday, February 24

Full-chip high Sigma probabilistic modeling, defect detection and repair in advanced EUV nodes

2:00 PM - 2:20 PM PST | Convention Center, Grand Ballroom 220B

Machine learning enhanced optical proximity correction modeling for high-NA EUV lithography (Invited Paper)

3:30 PM - 3:50 PM PST | Convention Center, Grand Ballroom 220B

Production high-NA EUV stitch coloring and physical verification for physical design and mask synthesis

4:10 PM - 4:30 PM PST | Convention Center, Grand Ballroom 220B

Co-optimized double exposure stitching with ILT to maximize high-NA EUV process window

4:50 PM - 5:10 PM PST | Convention Center, Grand Ballroom 220B

Wednesday, February 25

Understanding the MOR underlayer effect using lithographic modeling

1:40 PM - 2:00 PM PST | Convention Center, Room 210C

Including prior design intent information to enhance contour extraction robustness for CD-SEM metrology

5:30 PM - 7:00 PM PST | Convention Center, Hall 2

Thursday, February 26

Flexible and expandable automatic OPC hotspot repairing flow

9:20 AM - 9:40 AM PST | Convention Center, Grand Ballroom 220B

Near-optimal sampling of physical design layout regions based on rigorous pattern coverage (Invited Paper)

1:20 PM - 1:40 PM PST | Convention Center, Grand Ballroom 220B

Manufacturing space optimization: Accelerating mask synthesis with reinforcement learning for ILT and SMO optimization

4:10 PM - 4:30 PM PST | Convention Center, Grand Ballroom 220B