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CATS - Computer Aided Transcription System Software
Technology Leading Mask Data Prep
CATS® is a highly scalable and flexible software application that transcribes complex design data into machine readable instructions for e-beam and laser machines used for the pattern generation and manufacturing of IC, MEMS, TFT-LCD, TFH, photonics, and biochip products.
CATS has installations in virtually every photomask manufacturing facility worldwide, and is the de facto standard for mask manufacturing, inspection, metrology, and direct-write-on-wafer.
Applications
- Basic and Advanced Fracture
CATS fracturing addresses challenges associated with different mask writers and inspections tools.
- Proximity Effect Correction
CATS provides correction of E-beam and Optical Proximity Effects
- Jobdeck Operations
Powerful and highly interactive mask and pattern support
- Manufacturing Rule Check
CATS is the only available software package to support e-beam and laser exposure tools, as well as all major inspection tools.
- Lithography Output Options
Comprehensive data prep solutions for mask and direct write
- Metrology Marking
Using jobdeck information and electron beam pattern file data, CATS Metrology Marking option provides a unique graphical and command-driven environment.
- Inspection Data Prep
CATS is the only commercially available software package to support both a wide variety of electron beam exposure tools and all major photomask inspection tools.
- Distributed Processing
CATS delivers highly scalable and cost-effective Mask Data Preparation.