Synopsys S-Metro provides a comprehensive and powerful toolbox for automated assessment of numerical and image-based metrology data for photomask qualification, modeling data preparation, and process characterization. Process engineers use it to measure the lithographic performance, for instance through process window analysis.
Metrology images from any source, whether photomask or wafer, can be processed and analyzed in Synopsys S-Metro as well. Images are aligned to the corresponding layout and can be averaged to improve contrast; contours are extracted for use in model calibration and validation as well as for training machine learning modes.
Synopsys S-Metro automatically processes SEM image and CD data in a consistent and transparent manner. The infrastructure is capable of handling tens of thousands of data points and scales well on compute clusters.