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Synopsys has a proven track record for delivering the leading solutions targeting the most advanced process nodes. In collaboration with IDMs, foundries and academia, Synopsys delivers the industry’s most comprehensive and effective FinFET solutions. Most of the world’s FinFET devices are designed with Synopsys TCAD tools; Synopsys has the broadest portfolio of silicon-proven IP for FinFET, and more than 90% of the leading volume-production SoCs have been designed with the Synopsys Design Platform. Synopsys’ new Custom Compiler™ visually-assisted custom layout solution is tuned for rapid implementation, shortening the time it takes to complete FinFET custom design tasks from days to hours.
Advanced geometry nodes such as FinFET pose significant design and manufacturing challenges that impact some implementation tools. In particular, complex multi-patterning lithography requirements involve:
Advanced geometry nodes will enable designs to run at a multi-GHz+ operating frequency. In order to achieve this, improved modeling, guidance and analysis should be handled by the tools with high degrees of predictability throughout the design flow. Size and performance requirements for next-generation designs require higher levels of capacity, enhanced multi-core processing for faster runtime and an integrated design environment to maximize design productivity. Synopsys’ comprehensive, foundry-certified advanced geometry solution provides the following features that help designs make it to market faster:
Synopsys is actively working with leading foundries, consortiums and eco-system partners to address the significant challenges of advanced FinFET process technologies. This results in availability of foundry certified solutions in the shortest possible time.