EDA
System
IP
SolvNetPlus
Training & Education
Taurus TSUPREM-4 is an advanced 1D and 2D process simulator for developing semiconductor process technologies and optimizing their performance. With a comprehensive set of advanced process models, Taurus TSUPREM-4 simulates the process steps used for fabricating semiconductor devices, reducing the need for costly experiments using silicon. In addition, Taurus TSUPREM-4 has extensive stress modeling capabilities, allowing optimization of stress to increase device performance.
Benefits
- Develop cost effective, leading-edge CMOS, bipolar, and power device manufacturing processes
- Predict 1D and 2D device structure characteristics by accurately simulating ion implantation, diffusion, oxidation, silicidation, epitaxy, etching and deposition processing, reducing experimental runs and technology development time
- Analyze stress history in all layers as a result of thermal oxidation, silicidation, thermal mismatch, etching, deposition and stress relaxation
- Study impurity diffusion, including oxidation-enhanced diffusion (OED), transient-enhanced diffusion (TED), interstitial clustering, dopant activation and dose loss
Ask
i
NOTICE: You are interacting with an AI-powered chatbot that provides general information about Synopsys, including its products and services, which may be incorrect or incomplete. In the event of any conflict or discrepancy, the terms of your applicable agreements supersede any information provided by this chatbot. These chats may be accessed by Synopsys and its service providers to customize the experience and improve this tool, and your use of this chatbot is an agreement to that data processing activity.