Synopsys
Ansys

Calibration & Services

For Optimizing TCAD Deployment Success

Synopsys TCAD tools are used by process and device engineers at all major semiconductor companies to develop and optimize semiconductor technologies. Occasionally, the tools need to be calibrated for a specific technology, so that they can be more predictive for future nodes.

Synopsys TCAD Services offers calibration, simulation, model development, and consulting to customers. Our team has extensive know-how in helping customers to deploy TCAD-based technology development methodologies, resulting in a significant increase in engineering productivity, reduction in development costs, and improvement in product yield. Drawing upon a wide spectrum of experience and expertise from TCAD modeling and technology development, our experts deliver turnkey solutions for consistent, accurate, and predictive process–device modeling of a wide range of technologies, such as Logic, Analog and Discrete, Memory, Optical, and Electrostatic Discharge (ESD).

Sentaurus Calibration Workbench

Accelerate TCAD calibration with automated, machine learning-based workflows that help engineers achieve accurate, predictive simulation results with less setup and fewer simulations.

Expert calibration modules provide up to 80% of the calibration workflow pre-built, helping engineers quickly get started with a productivity boost in calibration workflow creation. Enhanced machine learning capabilities, including active learning, advanced sampling techniques, and uncertainty-aware neural networks, make it easier to create efficient, reusable calibration workflows.

Sentaurus ML Calibration Accelerator

Scale compute for demanding ML-based calibration workflows with Sentaurus ML Calibration Accelerator, a new companion product to Sentaurus Calibration Workbench. It works with existing calibration workflows and helps engineers rapidly recalibrate TCAD models as new test data becomes available.

Key Capabilities

  • Get started faster with expert-curated calibration modules
  • Extract metrology profiles from TEM and SEM data with manual or guided workflows
  • Reduce DOE requirements with active learning and advanced sampling
  • Create and reuse customized calibration modules and workflows
  • Accelerate ML model training with uncertainty-aware neural networks

Publication

Model for elimination of lifetime-limiting carbon vacancy defects in SiC by thermal treatment (Journal of Applied Physics)

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