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Mask Synthesis is comprised of lithographic tools for both development and batch use models. Proteus’ batch tools provide a comprehensive and powerful environment for performing full-chip optical proximity correction (OPC), inverse lithographic techniques (ILT), and process checking and analysis on post-corrected IC layout patterns.
For development use models, Proteus and Sentaurus Lithography have been tightly integrated to provide the upmost accuracy and predictability to delivery faster time-to-market results. Synopsys’ Mask Synthesis tools have been industry tested for almost two decades and are the tool of choice for leading-edge IDM’s and foundries.