Lithography Output Options

Comprehensive data prep solutions for mask and direct write

The CATS software package transcribes design data into readable e-beam and laser machine instructions. This includes support for virtually all mask and direct write equipment suppliers. CATS works closely with each lithography tool manufacturer to ensure that each data conversion has been optimized and tested for efficient mask writer performance. The following is a list of the current interface formats supported and is categorized by lithography technology type (E-Beam, Laser, or Optical Pattern Generator).

Lithography Output Options:

E-Beam:

  • Cambridge
  • Hitachi
  • JEOL
  • MEBES
  • Philips
  • Toshiba/NuFlare
  • Varian ALF

Laser:

  • Applied Materials ALTA
  • Micronic

Optical Pattern Generator:

  • Electromask English, Metric
  • Mann 3000, 3600, Eng., Metric