- Silicon Design & Verification
- Silicon IP
- Software Integrity
- About Us
- Silicon Design & Verification Products
- Solutions
- Resources
- Services
- Community
- Training
- Silicon IP Products
- Solutions
- Resources
- Services
- Community
- Software Integrity
- Services
- Solutions
- Resources
- Training and Education
- Support
- About Us
< Silicon Design & Verification Products
< Silicon Design & Verification Products
< Silicon Design & Verification Products
< Silicon Design & Verification Products
3D Model Generation
Simpleware Products
Simpleware for Life Sciences
Simpleware for Materials & Manufacturing
< Silicon Design & Verification Products
< Silicon Design & Verification Products
< overview
Silicon Design & Verification Products
+
Design
+
System Simulation & Modeling
+
Verification Continuum
+
3D Model Generation
+
Silicon Engineering
+
Optical Solutions
< Solutions
< Solutions
< Solutions
< Resources
< Resources
< Resources
< overview
< Services
< Services
< Services
< Community
Community
Community Overview
< Community
< Community
< Community
< Community
< Community
< Community
< Community
< overview
Community
+
Community
+
SNUG
+
Partners
+
EmbARC.org
+
Interoperability
+
Academic Programs
+
Company Blogs
+
BSIMM
< Training
< overview
< main menu
< Silicon IP Products
< Silicon IP Products
Memories & Libraries
Logic Libraries
Memory Compliers
Duet Packages
HPC Design Kit
Embedded Test & Repair
Non-Volatile Memory
< Silicon IP Products
< Silicon IP Products
Processor Solutions
ARC Processors
Embedded Vision Processors
Development Tools
Operating Systems
Ecosystem
ASIP Tools
< Silicon IP Products
< Silicon IP Products
< Silicon IP Products
< Silicon IP Products
< Silicon IP Products
< overview
Silicon IP Products
+
Interface IP
+
Memories & Libraries
+
Analog IP
+
Processor Solutions
+
IP Subsystems
+
Security IP
+
Market Segments
+
IP Accelerated
+
SoC Infrastructure IP
< Solutions
< Resources
< Services
< Services
< Services
< Community
Community
Community Overview
< Community
< Community
< Community
< Community
< Community
< Community
< Community
< overview
Community
+
Community
+
SNUG
+
Partners
+
EmbARC.org
+
Interoperability
+
Academic Programs
+
Company Blogs
+
BSIMM
< Software Integrity
< Software Integrity
< Services
< Services
Program Development & Design
BSIMM Maturity Model
Maturity Action Plan (MAP)
Policies & Standards
Metrics
Software Security-in-a-Box
< Solutions
< Solutions
< Resources
< Resources
Listen
Podcasts
< Training and Education
Product Education
< Support
< Support
Contact Support
< main menu
< About Us
< About Us
< About Us
< About Us
< About Us
< About Us
Lithography Output Options
Comprehensive data prep solutions for mask and direct write
The CATS software package transcribes design data into readable e-beam and laser machine instructions. This includes support for virtually all mask and direct write equipment suppliers. CATS works closely with each lithography tool manufacturer to ensure that each data conversion has been optimized and tested for efficient mask writer performance. The following is a list of the current interface formats supported and is categorized by lithography technology type (E-Beam, Laser, or Optical Pattern Generator).
Lithography Output Options:
E-Beam:
- Cambridge
- Hitachi
- JEOL
- MEBES
- Philips
- Toshiba/NuFlare
- Varian ALF
Laser:
- Applied Materials ALTA
- Micronic
Optical Pattern Generator:
- Electromask English, Metric
- Mann 3000, 3600, Eng., Metric