IC WORKBENCH EDIT/VIEW PLUS
A powerful, hierarchical layout visualization and analysis tool, which allows viewing and editing GDSII and OASIS layouts from small IP blocks to full chip databases.
Proteus provides a comprehensive and powerful environment for performing full-chip proximity correction, building models for correction, and analyzing proximity effects on corrected and uncorrected IC layout patterns.
Proteus LRC is Synopsys' next generation OPC verification tool enabling fast and accurate hotspot detection across the process window for full-chip mask validation within the Proteus Pipeline Technology.
Proteus ILT uses inverse imaging technology to resolve the most challenging optical proximity effects encountered on dense designs at leading technology nodes.
Proteus WorkBench provides a single tool environment that facilitates building models, tuning correction recipes for full-chip OPC, and analyzing proximity effects on corrected and uncorrected IC layout patterns.
SENTAURUS LITHOGRAPHY PWA
Sentaurus Lithography PWA is a comprehensive and powerful tool for process window analysis. It is used to evaluate and visualize simulation results or experimental data, for example, obtained by critical dimension (CD) metrology measurements.
Sentaurus Lithography represents advanced lithography simulation for semiconductor device manufacturing process development and optimization.
TCAD device simulation can identify and investigate ESD relevant effects and the internal behavior of the device under ESD stress conditions.
Sentaurus is a suite of TCAD tools which simulates the fabrication, operation and reliability of semiconductor devices.
STRESS ENGINEERING SERVICES
Synopsys TCAD Services offers a range of services to address device optimization and process integration issues in stress engineering, including adding mechanical stress and advanced classical or Monte Carlo device simulations to customer process flows, exploring new structures and processes, and extending simulator capabilities.
SYNOPSYS TCAD SERVICES
Synopsys TCAD Services targets the optimization of processes and devices using TCAD tools and the investigation of technology development and manufacturing issues using process and device modeling methods.
Mask Data Prep
CATS™ is the most advanced and full featured mask data preparation (MDP) software available for semiconductor photomask manufacturing.
SmartMRC offers industry’s highest performance solution for mask rule check and pattern matching. Combined with a comprehensive set of checks SmartMRC significantly improves data verification efficiency for most complex designs at advanced technology nodes.
Avalon software system is the next-generation CAD navigation standard for failure analysis, design debug and low-yield analysis.
Odyssey is a production-centric yield management solution for wafer manufacturing.
Layout visualizing and signal tracing CAD navigation solution for PCB, multi-chip module (MCM) and stacked die applications.
Design-centric yield management for product engineering
Customizable yield-management software that helps achieve and maintain high yields by allowing engineers to quickly collect, correlate, analyze and share critical data.