Full-Chip Mask Synthesis
Proteus provides a comprehensive and powerful environment for performing full-chip proximity correction, building models for correction, and analyzing proximity effects on corrected and uncorrected IC layout patterns. Proteus mask synthesis products are the tools of choice for leading edge IDMs and foundries and have been production proven for over a decade.
Proteus Pipeline Technology provides a fully concurrent tapeout flow for maximum CPU utilization and is a major departure from serial manufacturing flows, in which a complete post-optical proximity correction (OPC) database must be available before the latter applications can be initiated. Using a dual-domain simulation engine which combines the strength of field-based simulation and flash-based simulation, Proteus delivers the most accurate OPC results and fastest turnaround time for both dense and sparse designs. Proteus’ programmability and modularized applications provide optimal flexibility while ensuring protection of valuable customer IP.