UMC-Synopsys Collaboration

Collaborating for Successful SoC Designs

United Microelectronics Corporation (UMC) and Synopsys collaborate to provide advanced design methodology and process technology. Founded in 1980, UMC is Taiwan’s first semiconductor company and a leading global semiconductor foundry that provides advanced technology and manufacturing for applications spanning every major sector of the IC industry. Synopsys and UMC collaboration is committed to timely delivery of leading-edge solutions that serve specific and unique requirements of our mutual customers in today’s advanced applications and SoC designs. 

Synopsys' Optimized Design Environment for UMC Process

Synopsys and UMC collaborated to deliver an optimized design environment for UMC 28nm HLP process technology based on Synopsys’ Lynx Design System which is ready to deploy today. By teaming together, we are delivering a production-proven design solution based on Synopsys' Galaxy™ Design Platform that allows designers to use the latest leading-edge technologies for their most challenging SoCs. Our collaboration will also extend to UMC 14nm FinFET process technology in the future.

Benefits and Features

Enables Fast Track to Tape-out using mature, proven design methodology for RTL to tapeout

  • Comprehensive library and technology file checks
  • STA flow using AOCV table
  • Intelligent STA and RC extraction tasks generation
  • PrimeTime ECO flow
  • In-Design PrimeRail power analysis
  • In-Design metal fill flow 

DesignWare IP Solutions for UMC Process

Synopsys provides a comprehensive portfolio of silicon-proven DesignWare IP solutions for UMC process technologies ranging from 65-nm to 14-nm FinFET. The IP solutions consist of logic libraries, embedded memories, embedded test, analog IP and wired and wireless interface IP.