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Wolfgang Demmerle
Wolfgang is a product manager for Synopsys’ computational lithography and metrology solutions, focusing on rigorous lithography simulation and scanning electron microscope (SEM) metrology data analysis. Before joining Synopsys in 2006, Wolfgang gained lithography process experience through engieering positions at Nikon and ASML. He received a doctor's degree in Semiconductor Physics from the Technical University of Munich (Germany).
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