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Discover Synopsys Insights Shared at SPIE Photomask Technology + Extreme Ultraviolet Lithography 2025
- High-NA EUV optical proximity correction modeling flow: from data preparation to model validation
- Multilayer defects: impact on aerial image through focus
- Rigorous calibration and validation of high sigma defect prediction models
- Virtual fabrication of a 3 nm gate all around inverter