Mixed-Signal IP Design Challenges in 28-nm Process and Beyond
As process technologies continue to scale aggressively, it is becoming more challenging when developing high-quality, high-speed mixed-signal IP. Specifically, the 28-nm process poses some unique challenges not found in 65-nm and 40-nm technology processes.
This paper discusses the low power requirements found in 28-nm processes and addresses issues associated with the aggressive scaling of the core supply voltages in these technology processes. It also focuses on restricted design rules and how they
have created a paradigm shift in the way circuits are designed and laid out in 28-nm processes as well as describes techniques to maximize design and layout reuse. Furthermore, the paper details design-for-yield challenges encountered in 28-nm processes and the verification methodologies used to ensure robust and manufacturable IP.
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