SPIE Photomask 2018

Date and Location

September 17-20, 2018
Monterey Conference Center and Monterey Marriott
Monterey, California

Visit Synopsys at SPIE Photomask Technology 2018, the key technical meeting for mask makers, EUVL, emerging technologies, and the future of mask business.

Synopsys Technical Sessions

Paper [10810-2]: The self-driving photomask, James P. Shiely, Synopsys 

Paper [10810-4]: Fracture time predictor in mask data preparation using machine learning - Diego Palma & Daniel Calderon, Synopsys

Paper [10810-40]: KLA DNIR generation by SmartMRC - Xiaoming Fan, Xuan Zhu, Cong Lu & Danyi Zhu, Semiconductor Manufacturing International Corp; Yuan Zhang & Kokoro Kato, Synopsys

Paper [10810-44]: 3D NTD resist deformation compact model for OPC and ILT applications - Rich Wu, Delian Yang, Folarin Latinwo, Kevin Lucas & Hua Song, Synopsys