SPIE Advanced Lithography 2020
February 23-27, 2020
San Jose Convention Center
Monday, February 24
12:30 p.m. to 4:30 p.m.
Salon IV Ballroom
301 South Market Street
San Jose, CA 95113
IMPORTANT NOTE: The location has changed from the San Jose Hilton in 2019 to theMarriott Hotel this year. See you at the Marriott!
Please join us for our 2020 Technical Forum to learn the latest on Synopsys Manufacturing's mask synthesis, mask data prep and lithography simulation solutions. The Technical Forum is peer-to-peer, giving you the opportunity to hear how your lithography colleagues have addressed the challenges of 3/5nm and beyond.
Visit Synopsys at Booth #204
Tuesday, February 25: 10:00 a.m. - 5:00 p.m.
Wednesday, February 26: 10:00 a.m. - 4:00 p.m.
San Jose Convention Center
San Jose, CA
Synopsys provides industry-proven EDA solutions to meet the demands of today’s advanced IC manufacturing processes while setting the standard in platform flexibility to enable innovative and custom solutions for next-generation technology nodes. Synopsys’ comprehensive Mask Synthesis, Mask Data Preparation, TCAD, and Yield Management tools provide leading edge performance, accuracy, quality, and cost of ownership for all your production and development needs.
Synopsys Technical Program
- Lithographic pattern formation in the presence of aberrations in anamorphic optical systems
Zac A. Levinson, Synopsys, Inc. (USA); Bruce W. Smith, Rochester Institute of Technology (USA) [11323-6]
Monday, 1:20 p.m. to 3:20 p.m.
- EUV lithography stochastic simulations of a MOx-specific parameterized resist model: calibration and comparisons with experimental data
Craig D. Needham, Amrit K. Narasimhan, Inpria Corp. (USA); Lawrence S. Melvin, Synopsys, Inc. (USA); Ulrich Welling, Synopsys GmbH (Germany); Stephen Meyers, Inpria Corp. (USA) [11323-12]
Monday, 3:50 p.m. to 5:50 p.m.
- Prediction of EUV stochastic microbridge probabilities by lithography simulations
Erik A. Verduijn, Synopsys GmbH (Belgium); Ulrich Welling, Jiuzhou Tang, Hans-Jürgen Stock, Ulrich Klostermann, Wolfgang Demmerle, Synopsys GmbH (Germany); Peter De Bisschop, imec (Belgium)) [11323-16]
Tuesday, 10:30 a.m. to 12:30 p.m.
- Simulation of photoresist defect transfer through subsequent patterning processes
Dominik Metzler, IBM Thomas J. Watson Research Ctr. (USA); Sagarika Mukesh, Karthik Yogendra, IBM Corp. (USA); Mohamed Oulmane, Synopsys Switzerland, LLC (Switzerland); Phil Stopford, Lawrence Melvin, Synopsys, Inc. (USA) [11329-18]
Wednesday, 8:00 a.m. to 10:00 a.m.
- Rigorous stochastic lithography modelling for defectivity reduction in EUV single expose patterning
Ulrich Welling, Synopsys GmbH (Germany) [11323-39]
Wednesday, 4:10 p.m. to 4:50 p.m.
- An application study on the stochastic effect of EUV photons
Jongsu Kim, Hyekyoung Jue, Hyungju Ryu, Sang-Jin Kim, Joon-Soo Park, Kyoungsub Shin, SAMSUNG Electronics Co., Ltd. (Korea, Republic of); Eun-Soo Jeong, Sang-Yil Chang, Jung-Hoe Choi, Synopsys Korea Inc. (Korea, Republic of); Ulrich Welling, Jürgen Preuninger, Ulrich Klostermann, Hans-Jürgen Stock, Wolfgang Demmerle, Synopsys GmbH (Germany) [10323-45]
Thursday 8:00 a.m. to 10:20 a.m.
- Compact modeling to predict and correct stochastic hotspots in EUVL
Zac A. Levinson, Yudhishthir Kandel, Qiliang Yan, Makoto Miyagi, Xiaohai Li, Kevin Lucas, Synopsys, Inc. (USA) [11323-71]
Wednesday, 5:30 p.m. to 7:30 p.m.
Schedule a Meeting
If you are planning to attend SPIE Advance Lithography and would like to schedule an onsite meeting with the Synopsys Manufacturing team, please send an email to email@example.com with your full name, business title, company name, phone number, and the subject you’d like to discuss.