Synopsys at SPIE Advanced Lithography 2019


February 24-28, 2019
San Jose Convention Center

Synopsys Technical Forum

Monday, February 25
12:30 p.m. to 4:30 p.m. 

San Jose Hilton
Almaden Ballroom
300 Almaden Blvd.
San Jose, CA 95110

IMPORTANT NOTE: The location has changed from the San Jose Marriott in 2018 to the San Jose Convention Center Hilton this year. See you at the Hilton!
 

Please join us for our 2019 Technical Forum to learn the latest on Synopsys Manufacturing's mask synthesis, mask data prep and lithography simulation solutions. The Technical Forum is peer-to-peer, giving you the opportunity to hear how your lithography colleagues have addressed the challenges of 3/5nm and beyond.

Agenda

Time Presentation Title Speaker Company
12:30 Registration & Lunch
1:00 Welcome & Introduction
1:10 Systemic Solutions for 5/3nm Deployment
Howard Ko
Synopsys
1:30 Breaking Through EUV Stochastic Barriers – Gaining Insights with the Convergence of Models and Empirical Data
Dan Corliss
IBM
2:15 Break & Prize Drawing #1
3:00 Maximizing Common Process Window for Advanced Memory with Inverse Lithography Target Optimization and Correction
Ping Digaum
Micron
3:30 Unleashing Differentiated Technologies for Smart, Connected Computing
Jim Blatchford
GlobalFoundries
4:10 Thank You & Drawing #2 and #3

Visit Synopsys at Booth #204

Tuesday, February 26: 10:00 a.m. - 5:00 p.m.            
Wednesday, February 27: 10:00 a.m. - 4:00 p.m.

Location

San Jose Convention Center
San Jose, CA
Directions

Overview

Synopsys provides industry-proven EDA solutions to meet the demands of today’s advanced IC manufacturing processes while setting the standard in platform flexibility to enable innovative and custom solutions for next-generation technology nodes. Synopsys’ comprehensive Mask Synthesis, Mask Data Preparation, TCAD, and Yield Management tools provide leading edge performance, accuracy, quality, and cost of ownership for all your production and development needs.

Synopsys Technical Program

Papers
  • PSCAR optimization to reduce EUV resist roughness with sensitization
    Seiji Nagahara, Tokyo Electron Ltd. (Japan); Cong Que Dinh, Gosuke Shiraishi, Tokyo Electron Kyushu Ltd. (Japan); Yuya Kamei, Tokyo Electron Ltd. (Belgium); Michael A. Carcasi, Tokyo Electron America, Inc. (USA); Hiroyuki Ide, Yoshihiro Kondo, Yuichi Yoshida, Kosuke Yoshihara, Ryo Shimada, Masaru Tomono, Kazuhiro Takeshita, Tokyo Electron Kyushu Ltd. (Japan); Kathleen Nafus, Tokyo Electron America, Inc. (Belgium); Serge Biesemans, Tokyo Electron Europe Ltd. (Belgium); Hideo Nakashima, Tokyo Electron Ltd. (Japan); John S. Petersen, Danilo De Simone, Philippe Foubert, Geert Vandenberghe, IMEC (Belgium); Hans-Jürgen Stock, Balint Meliorisz, Synopsys GmbH (Germany) [10960-9]
    Tuesday, 10:30 a.m. to 12:10 p.m.

  • Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning
    Sheng-Wei Chien, Jia-Syun Cai, Chien-Lin Lee, Kuen-Yu Tsai, National Taiwan Univ. (Taiwan); James P. Shiely, Matt St. John, Synopsys, Inc. (USA) [10961-6]
    Tuesday, 10:30 a.m. to 12:10 p.m.

  • Impact of EUV absorber variations on wafer patterning
    Lawrence S. Melvin III, Yudhishthir Kandel, Tim Fühner, Synopsys, Inc. (USA); Ulrich Welling, Synopsys Belgium BVBA (Belgium); Emily Gallagher, Andreas Frommhold, IMEC (Belgium); Yoshitake Shusuke, NuFlare Technology, Inc. (Japan) [10957-19]
    Tuesday, 1:40 p.m. to 3:20 p.m.

  • Efficient search of layout hotspot patterns for matching SEM images using multilevel pixilation
    Sean Shang-En Tseng, National Taiwan Univ. (Taiwan); Wei-Chun Chang, National Chiao Tung Univ. (Taiwan); Iris Hui-Ru Jiang, National Taiwan Univ. (Taiwan); Jun Zhu, James P. Shiely, Synopsys, Inc. (USA) [10961-9]
    Tuesday, 1:40 p.m. to 3:20 p.m.

  • Improved validation and optimization of physics-based NTD compact modeling flows
    Folarin Latinwo, Delian Yang, Synopsys, Inc. (USA); Cheng-En Wu, Synopsys Taiwan Co., Ltd. (Taiwan); Peter Brooker, Hua Song, Kevin Lucas, Synopsys, Inc. (USA) [10961-14]
    Tuesday 3:50 p.m. to 5:30 p.m.

  • Fast detection of largest repeating layout pattern
    Jingsong Chen, Evangeline F.Y. Young, The Chinese Univ. of Hong Kong (Hong Kong, China); James Shiely, Charles Chiang, Synopsys Inc. (USA) [10962-9]
    Wednesday, 10:30 a.m. to 12:10 a.m.

  • Investigation of machine learning for dual OPC and assist feature printing optimization
    Kevin Hooker, Marco Guajardo, Synopsys, Inc. (USA); Rich Wu, Synopsys Taiwan Co., Ltd. (Taiwan); Peter Brooker, Kevin Lucas, Synopsys, Inc. (USA) [10962-13]
    Wednesday, 1:40 p.m. to 3:20 p.m.

  • 3D optical proximity model optimization using inline 3DSEM metrology
    Shimon Levi, Applied Materials Israel, Ltd. (Israel); Hans-Jurgen Stock, Wolfgang Demmerle, Synopsys GmbH (Germany) [10959-55]
    Thursday, 8:00 a.m. to 10:00 a.m.

  • SAQP spacer merge and EUV self-aligned block decomposition at 28nm metal pitch on imec 7nm node
    Jae Uk Lee, Syed Muhammad Yasser Sherazi, IMEC (Belgium); Soo-Han Choi, Synopsys, Inc. (USA); Ryoung-Han R. Kim, IMEC (Belgium) [10962-22]
    Thursday, 10:30 a.m. to 12:10 p.m.

  • EUV computational lithography using accelerated topographic mask simulation
    Vitaly  Domnenko, Synopsys SPb, LLC (Russian Federation); Bernd Küchler, Wolfgang Hoppe, Jürgen Preuninger, Ulrich Klostermann, Wolfgang Demmerle, Martin Bohn, Dietmar Krüger, Synopsys GmbH (Germany); Ryoung-Han R. Kim, Ling Ee Tan, IMEC (Belgium) [10962-23]
    Thursday, 10:30 a.m. to 12:10 p.m.

  • EUV mask synthesis with rigorous ILT for process window improvement
    Kyle Braam, Guangming Xiao, Synopsys, Inc. (USA); Wolfgang Hoppe, Ulrich Klostermann, Synopsys GmbH (Germany); Kevin Lucas, Synopsys, Inc. (USA) [10962-24]
    Thursday, 10:30 a.m. to 12:10 p.m.
     
Poster
  • Calibrated PSCAR stochastic simulation
    Cong Que Dinh, Tokyo Electron Kyushu Ltd. (Japan); Seiji Nagahara, Tokyo Electron Ltd. (Japan); Gousuke Shiraishi, Yuya Kamei, Tokyo Electron Kyushu Ltd. (Japan); Michael Carcasi, Tokyo Electron America, Inc. (USA); Hiroyuki Ide, Yoshihiro Kondo, Yuichi Yoshida, Kosuke Yoshihara, Ryo Shimada, Masaru Tomono, Kazuhiro Takeshita, Tokyo Electron Kyushu Ltd. (Japan); Kathleen Nafus, Tokyo Electron America, Inc. (USA); Serge Biesemans, Tokyo Electron Europe Ltd. (Belgium); John S. Petersen, Danilo De Simone, Philippe Foubert, Peter De Bisschop, Geert Vandenberghe, IMEC (Belgium); Hans-Jurgen Stock, Balint Meliorisz, Synopsys GmbH (Germany) [10957-56]
    Wednesday, 10:00 a.m. to 7:30 p.m.

 

Schedule a Meeting

If you are planning to attend SPIE Advance Lithography and would like to schedule an onsite meeting with the Synopsys Manufacturing team, please send an email to manufacturing@synopsys.com with your full name, business title, company name, phone number, and the subject you’d like to discuss.