PDK CEA-Leti (Si 310nm passives)

The silicon photonics design kit contains the design rules and building blocks for Multi Project Wafer and custom runs offered by CEA-Leti in their platform: Si310-PH

This PDK is a licensed plug-in library for OptoDesigner and supports Multi Project Wafer and custom runs provided by CEA-Leti in Grenoble, France. In addition to the photonic elements from the standard OptoDesigner library, the PDK contains technology-specific information like mask layer names, design rules, validated building blocks, die sizes, and GDS file settings.

Regular training sessions are being organised to introduce the technology platform and the software tools to (potential) users.

CEA-Leti collaborates with CMP to offer their MPW services.

CEA-Leti Si310-PH - PDK contents [v2019.03_10_3, March 2019]

310nm Si / 800nm BOX on 200mm platform, optimized for 1310nm wavelength applications. The technology has compatible design rules with a 300mm industrial foundry, allowing for scale-up to high volume manufacturing.

  1. Technology set-up files
  2. Material and cross-sectional information for simulations (like mode analysis including sweep on e.g. line width or silicon layer thickness variations)
  3. Die templates for layout generation
  4. Set of validated and fixed passive building blocks (optimized for 1310nm operation):
    • 1D and 2D grating couplers
    • 1x2 MMI
    • Waveguide transitions
  5. Library of passive components
    • Waveguides primitives, like straights and bends
    • Complete generic library of photonic passive components: e.g. add-drop ring filters, MZI's, splitters, MMI's, and more
    • Electrical tracks and bondpads
    • Heaters
  6. Design Rules
  7. GDSII mask file generation