◆ 開催日時 両日とも同一の内容です
1回目: 2023年1月31日 (火) 14:30 - 16:30
2回目: 2023年2月2日 (木) 14:30 - 16:30
#[ZOOM Webinar] を使ったオンライン配信を予定しております。
(会場を設定したプレゼンテーションはございません)
◆ 対象のお客様
Sentaurus TCADおよび関連製品の保守契約を締結いただいているお客様
◆ 参加費
無償
◆ 申込締切
2023年1月30日 (月)
◆ お申込み 下記ボタンよりご希望の日付を選択の上、お申込みください
1/31(火)開催 2/2(木)開催
◆ アジェンダ
14:30 Introduction
14:35 Sentaurus Workbench, Sentaurus Calibration Workbench, Optimization Framework, Sentaurus Visual update
15:35 Q & A
15:40 Sentaurus Device, Sentaurus Process, Sentaurus Interconnect update
16:20 Q & A
16:30 Session Close
*お時間は前後する場合がございます。
◆Sentaurus TCAD U-2022.12の主な新機能
Sentaurus Workbench
- Preprocessor Performance Improvements
- Preprocessor Performance and Cyclic Dependency Checks
- Preprocessor Performance and Tcl Command Blocks
- Enhanced Exporting and Importing of Projects
- Removing Multiple Parameter Values
- Adding Experiments in a Flow With Locked Tools
- Update to Remove Parameter Value Dialog Box
- Background Project Operations
- Exporting and Importing Projects
- Single Tool Icon for Layout Editor Tools
Sentaurus Calibration Workbench
- Overview
- Sentaurus Calibration Workbench GUI
- XY Profile Targets/Miscellaneous
- Sensitivity Analysis
- Enhancements to Calibration Strategies
- No Support for Projects Based on Sentaurus Workbench Projects With Hierarchical Organization
Optimization Framework
- New Sentaurus Workbench DoE Options and API Change
- Parallel (Batch) Bayesian Optimization
- Additional Method for Problems With Categorical Parameters
- New Way to Set Optimization Conditions
- Enhancement of Acquisition Functions
- Unique Identifier for Optimization Targets
- Custom Stopping Criteria
Sentaurus Visual
- On-Demand Field Loading for Analysis
- Support for +Inf, -Inf, and None in get_variable_data() Command
- Extended Support for Custom Buttons Toolbar
- The set_curve_prop() Command No Longer Requires plot Option
- Improved Variable Parsing in Tcl Mode
- Copying and Pasting From Console Applies Formatting
- Cutplane Manipulation
- New remove_fields Command
- Scriptable Plot Lighting
- Change to Location of Curve Properties
- Multiple-Line Titles in XY Plots
- Improved Naming of Cutlines and Cutplanes
- Displaying Cut Coordinate in Plot Title
- Increased Maximum Resolution for Field Contours
- New Settings for 1D and 2D Axis Inversion
Sentaurus Device
- Optimization for Resistive Contacts Using Both Resist and DistResist
- Additional Plot Features for Saddle Point Analysis in CIS Devices
- Carrier Path Plotting
- Surface Recombination as an Interface Model
- DopingWells in CurrentPlot and Quasistationary Goal Command
- Netlist Parsing of Complex Expressions
- Better Parsing of Subcircuits Containing F-, H-, W-, and K-Elements
Sentaurus Process, Advanced Calibration for Process Simulation
- Surface Noise Reduction Technique for Monte Carlo Implantation
- Gaussian Distribution for Beam Divergence Angle in Monte Carlo Implantation
- Defining Mask-Based Boxes
- Allow emulated.oed.box to be mask driven
- Mask Option Enabled for 2D Trapezoidal Etch
- Improved Calibration of Sentaurus MC for H Implantation Into Silicon: Monte Carlo Model Parameters
Sentaurus Process / Sentaurus Interconnect共通
- Applying Interface Refinement to Only One Side
- Emulation of Periodic Boundary Condition
- Enhancement to Matrix Printing
- Mechanics Deformation Scaling and Delooping
- Defining Boundary Condition to Top of Bounding Box of Bulk Materials
- Adding Intrinsic Stress to Existing Stress Field
- Support for Adaptive Meshing in load Command
- Enhanced Region-Merging Functionality With mgoals Command
- Enhancement to Distributed Load
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*プログラムは予告なく変更される場合がございます。ご了承ください。