Mask Synthesis and Data Prep 

Design-to-Mask Manufacturing Excellence 

Proteus products provide a comprehensive and powerful environment for performing full-chip proximity correction, building models for correction, and analyzing proximity effects on corrected and uncorrected IC layout patterns. Proteus products are the mask synthesis tool of choice for leading-edge IDM‘s and foundries. 

CATS mask data preparation (MDP) software for semiconductor, TFT, HDD, MEMS and photonics mask and direct write equipment data preparation, is a highly scalable, easy to use, feature-rich product suite which provides data prep modules for data fracture, data verification, MRC, PEC, jobdeck processing, layer operations, and data sizing. CATS provides mask tapeout teams with a seamless extension to Proteus.

  • Tools
 
  • Proteus
  • Full chip mask synthesis products (OPC, MBAF, ProGenPLUS) more

 
Proteus provides a comprehensive set of pipelined-enabled mask synthesis tools, which offers the lowest cost of ownership design-to-mask flows on the market.
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Proteus LRC is Synopsys' next generation OPC verification tool enabling fast and accurate hotspot detection across the process window for full-chip mask validation within the Proteus Pipeline Technology
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Proteus MetroKit is a toolset designed to facilitate and automate the process of interfacing with metrology tools, thereby minimizing tool downtime and maximizing engineering efficiency.
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Proteus WorkBench provides a single tool environment that facilitates building models, tuning correction recipes for full-chip OPC, and analyzing proximity effects on corrected and uncorrected IC layout patterns.
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Alt-PSM technology for tighter control of chip performanceand increased yield.
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Sentaurus Lithography represents advanced modeling for semiconductor device manufacturing process development and optimization, covering a wide-range of applications in optical, immersion, EUV, and e-beam lithography.
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IC WorkBench Plus (ICWB+) is a powerful, hierarchical layout visualization and analysis tool with GDSII/OASIS viewing and editing and high-speed lithography simulation and analysis.
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A powerful, hierarchical layout visualization and analysis tool, which allows viewing and editing GDSII and OASIS layouts from small IP blocks to full chip database.
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  • CATS
  • Minimizes turnaround time, maximizes the quality of today's high-end masksmore

 
CATS™ is the most advanced and fully featured data preparation software available for semiconductor photomask manufacturing.
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A computational lithography tool that simplifies, optimizes, and reduces development time for advanced technology node design rules and products.


 
Inverse SynthesizerTM determines mask patterns that optimize images for pattern fidelity, image contrast, depth of focus, exposure latitude, and MEEF.