Process Window Analyzer (PWA)

The Process Window Analyzer (PWA) takes as its input observations, such as critical dimensions of a series features and determines usable process windows for each dataset, or the union of all of them. Input may come from experiments, simulations (so-called analysis runs) or a combination of both. Raw data from measurements can be processed directly, or after data reduction. The characteristic shape of response surfaces is often revealed only after smoothing. In addition, outliers are automatically detected. PWA offers several 2D fit functions and can easily be extended. It is general purpose in the sense that it can take any matrix of observations as a function of two parameters.

The main applications are the analysis of CD metrology data, the statistical analysis of measurement data, and the determination of process windows for any number of data sets

Benefits

• Enable fast and effective qualification of lithography process by flexible analysis of process windows and their properties
• Support conditioning of measurement data (e.g. by smoothing or flyer elimination) to improve input data quality for subsequent data fitting in order to obtain more robust models (resist model parameter, OPC models, etc.)
• Enable effective visualization of large and complex data sets