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Synopsys TCAD offers an extensive array of physical models to
simulate silicon-germanium devices at both process and device
simulation levels, including extraction of key device performance
parameters.
This Sentaurus TCAD simulation project provides a template setup for SiGe
HBT process simulations. The process simulations are performed by
Sentaurus Process incorporating advanced models to treat lattice mismatch
between germanium and silicon, and the effect of germanium on diffusion of
dopants and point defects.

SiGe HBT device; concentrations of dopants in the various regions are
shown; distances are in µm

Gummel plot for the SiGe HBT: base current (blue), collector
current (red), and DC current gain (black)
The simulation project is part of the Sentaurus TCAD distribution at:
- ../Example_Library/Bipolar/SiGeHBT_processing
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