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This Sentaurus TCAD simulation project provides a template setup
for farsubmicron CMOS device characterization.
IdVgs curves for a low drain bias and high drain
bias are simulated for NMOS and PMOS structures with various gate
lengths. In addition, for selected structures, a family of
IdVds
curves for various gate biases is simulated and small-signal
simulations are performed to obtain the CV characteristics of the
respective devices. For each of the simulated curves, relevant
electrical parameters, such as threshold voltages and drain current
levels, are extracted. Finally, the extracted parameters are plotted
as a function of the gate length.

Drain current as a function of drain voltage for the 90 nm gate length PMOS (left) and NMOS (right) devices simulated with Sentaurus Device; gate bias for curves is 0.6 V (blue), 0.9 V (green), and 1.2 V (red).

Total gate (Cgg, red), gate-contacts (Ccg, green), and gate-body (Cbg, blue) capacitance as a function of gate voltage for 90 nm gate length NMOS device simulated with Sentaurus Device.

Threshold voltage as function of gate length for NMOS (red) and PMOS (blue) devices.
The simulation project is part of the Sentaurus TCAD distribution at:
- ../Example_Library/CMOS/CMOS_characterization
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