TCAD
Dios

Dios is a 1D/2D process simulator for semiconductor devices. It simulates complete fabrication sequences including etching, deposition, ion implantation, diffusion, oxidation, and silicidation.

Benefits

• Efficient Monte Carlo implantation
• Availability of Advanced Calibration enhances accuracy of process simulation
• Efficient linear and nonlinear solvers
• Fully automated adaptive mesh