CATS -- The Manufacturing Data Preparation Standard

CATS™ is a full solution for photomask manufacturing data preparation. With installations in virtually every photomask manufacturing facility worldwide, it has become the de facto standard for mask manufacturing, inspection and direct-write-on-wafer data preparation.

With both interactive and batch processing modes, fast, high resolution, intuitive graphics and an entire host of query, data selection, and fracture options, CATS is a powerful and flexible software package.

Optional modules include plotting on a wide variety of Versatec plotters, HP plotters and Postscript™ printers, optimized support for common electron beam lithography systems, and optical pattern generator support for all popular systems. Also supported are die-to-database reticle inspection systems, jobdeck viewing and editing modules for several electron beam systems, and modules to support mask metrology tools. With options like these it's easy to see why CATS has become the overwhelming favorite integrated software package for mask and reticle data preparation, verification and inspection.

Customization for your site is simple with CATS' startup default file, macros, and user-definable graphics menus. CATS' command language offers sophisticated functions and linking to parameters and operations for powerful control and flexibility. Customization can be per site, per group, per user or per job.

CATS also provides a very simple means of integrating its analysis and fracturing functions with an automated work flow. Several customers have "plugged" CATS into their system for use as an analysis tool and as a high-speed fracture engine, and they use CATS' high-resolution, high-speed graphics tools for trouble-shooting.

CATS provides cutting-edge solutions for today's most demanding manufacturing challenges. It offers a fast, comprehensive graphics viewer and scalable distributed processing algorithms. It also supports advanced manufacturing rule checking of fractured patterns and jobdecks, and E-beam proximity correction.

Who Uses CATS?

CATS can be found in the majority of today's most advanced design and mask manufacturing operations; from corporations to government, from research to academic. 30% of CATS' installations are in semiconductor design operations and universities, another 30% installed at merchant mask making facilities, 25% in captive mask shops and a final 15% in research and/or direct write on wafer applications.