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- Distributed Processing
- Lithography Output Options:
- E-Beam:
- Cambridge
- Hitachi
- JEOL
- MEBES - Now with Mode-5 Support
- Micronic
- Philips
- Toshiba VSB 8/11
- Varian ALF
- Optical Pattern Generator:
- Electromask English, Metric
- Mann 3000,3600, Eng., Metric
- Design Output Options:
- Applicon
- GDSII Stream
- CIF
- Inspection Options:
- Graphical Options:
- MEBES Job Deck Viewing
- MEBES Job Deck Editing
- Hitachi Job Text File Viewing
- JEOL Job Deck Viewing
- JEOL Job Deck Editing
- Versatec Plotting
- Sixel (DEC) Plotting
- Postscript Plotting
- HP-RTL Plotting
- Metrology Options:
- SiScan RIF
- Leica LMS-2000 MF2
- Leica IPRO
- Nikon 2I & 3I Control File
- Zygo KMS
- KLA-8100 CD-Sem
- Fracture / Synthesis Options:
- CATS Jobdeck Smash
- CATS Keep (polygon selection)
- MRC: manufacturing rule checks
- CATS Serif Generation
- Proximity Correction Options:
- EBPC:
- Proxecco by aiss, GmbH
- Sceleton by aiss, GmbH
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