HOME    TOOLS    MANUFACTURING    SYNOPSYS AT SPIE ADVANCED LITHOGRAPHY 2013
Synopsys Papers and Presentations at SPIE

Mask compensation for process flare in 193nm very low-K1 lithography

Please complete the following form then click 'Continue >>' to complete the download. Note: By registering, you acknowledge and agree to the terms of the Synopsys Privacy Policy.

Required Required Fields

Business Email:Required
First Name:Required
Last Name:Required
Job Title:Required
Company:Required
Division:Optional
Country:Required
Address 1:Required
Address 2:Optional
City:Required
State/Province:
Optional
Postal/Zip Code:Required
Phone:Optional