TCAD Webcast Series 2008 
Resist Modeling with Sentaurus Lithography 

Overview
This webcast will provide an introduction to lithography simulation and will demonstrate the benefits of Synopsys TCAD Sentaurus Lithography using application examples. With Sentaurus Lithography, advanced lithography process simulation joins the physics-oriented technology simulation product family, TCAD Sentaurus.  Sentaurus Lithography replaces the SOLID product family, a set of well-established and proven simulation tools, with significant improvements in the areas of resist modeling, mask and wafer topography simulation, and integration with other Synopsys TCAD and mask synthesis tools.

Who Should Attend?
Lithography engineers and managers who want to learn practical techniques for simulating micro lithography processes and techniques to determine resulting resist profiles using a physical and highly predictive resist model in Sentaurus Lithography.

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