TCAD 

Process and Device Simulation Tools to Accelerate Innovation  

Technology Computer-Aided Design (TCAD) refers to the use of computer simulations to develop and optimize semiconductor processing technologies and devices. Synopsys TCAD offers a comprehensive suite of products that includes industry leading process and device simulation tools, as well as a powerful GUI-driven simulation environment for managing simulation tasks and analyzing simulation results. The TCAD process and device simulation tools support a broad range of applications such as CMOS, power, memory, image sensors, solar cells, and analog/RF devices. In addition, Synopsys TCAD provides tools for interconnect modeling and extraction, providing critical parasitic information for optimizing chip performance.

 

Sentaurus Process

An advanced 1D, 2D and 3D process simulator for developing and optimizing silicon process technologies


Taurus TSUPREM-4

A 1D and 2D process simulator for developing and optimizing silicon process technologies


Sentaurus Topography
A 2D and 3D simulator for physical modeling of topography-modifying process steps such as deposition, etching, spin-on-glass, reflow and CMP


Sentaurus Device
An advanced multidimensional (1D/2D/3D) device simulator for electrical, thermal and optical characterization of silicon-based and compound semiconductor devices


Taurus Medici
A 2D device simulator that models the electrical, thermal and optical characteristics of semiconductor devices


Raphael
A 2D and 3D resistance, capacitance and inductance extraction tool for optimizing multi-level interconnect structures and on-chip parasitics in small cells


Sentaurus Interconnect
Performs 3D interconnect stress and reliability simulations using design database and process recipes

  • Framework
  • Environment for managing and visualizing TCAD projectsmore

 
Includes analysis tools Sentaurus Workbench, Workbench Advanced and Workbench Visualization for TCAD project management and visualization


 
A flexible 2D and 3D device structure editor with advanced geometric modeling capabilities to generate structures for TCAD simulation


 
Optimizes processes/devices using TCAD tools and investigation of technology development, manufacturing issues using process and device modeling methods


Seismos LX
Analyzes impact of stress proximity effects on transistor electrical performance and generates accurate transistor-level netlists for circuit simulation


Seismos CX
Analyzes impact of lithography contour variability on transistor electrical performance and generates accurate transistor-level netlists for circuit simulation

Technology Computer-Aided Design (TCAD) refers to the use of computer simulations to develop and optimize semiconductor processing technologies and devices. Synopsys TCAD software solves fundamental, physical partial differential equations, such as diffusion and transport equations, to model the structural properties and electrical behavior of semiconductor devices. This deep physical approach gives TCAD simulation predictive accuracy for a broad range of technologies. Therefore, TCAD simulations are used to reduce the costly and time-consuming test wafer runs when developing and characterizing a new semiconductor device or technology.

Synopsys TCAD tools are used by all leading semiconductor companies throughout the technology development cycle. At the early stage of technology development, TCAD tools allow engineers to explore product design alternatives such as engineering the substrate to enhance channel mobility and meet performance goals even when experimental data is not readily available. During the process integration stage, Synopsys TCAD tools enable engineers to do simulation split runs such as Design of Experiment (DOE) to comprehensively characterize and optimize the process, which saves time and money by reducing experimental runs on real wafers. As the process is introduced into manufacturing, TCAD tools provide a mechanism for advanced process control during mass production, thereby improving parametric yield.

TCAD Solutions include:

  • Solar Cell Simulation
    Sentaurus TCAD simulation tools provide key insights into the internal physical mechanisms affecting solar cell performance, thereby increasing efficiency and reducing production costs.
  1. Explore new device structures to select viable process and device development pathways.
  2. Use TCAD to optimize process modules and integration by fully exploring the process parameter space while reducing the number of experimental wafers and development cycles.
  3. Apply TCAD to capture and analyze the impact of process variation on device performance, and to increase process capability, robustness and yield.


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