|Dec 16, 2014||Synopsys and Imec Expand TCAD Collaboration to 5 nm and Beyond|
Enables Delivery of Accurate Sentaurus TCAD Models for Nanowire,
FinFET and Tunnel-FET Transistors
|Jun 30, 2014||Synopsys and IIT Bombay Collaborate on Reliability|
Collaboration enables stochastic modeling of device degradation and reliability through industry leading Sentaurus Device TCAD simulator
|Jan 22, 2013||Synopsys Accelerates Adoption of FinFET Technology with Production-Proven Design Tools and IP|
FinFET Technology Support Developed over Five-year Collaboration with Industry Leaders
|Dec 12, 2012||Imec and Synopsys Expand FinFET Collaboration to 10 Nanometer Geometry|
Imec and Synopsys today announced that they have expanded their collaboration in the field of Technology Computer Aided Design (TCAD) to next-generation FinFET technology at 10 nm
|Nov 14, 2012||Synopsys and TSMC Enable Lithography Compliance Checking for 20nm|
Synopsys today announced the delivery of lithography compliance checking technology for the TSMC 20-nanometer (nm) DFM Data Kit (DDK) encapsulated with Synopsys?? Proteus mask synthesis technologies
|Mar 15, 2012||Synopsys and Applied Materials Collaborate on TCAD Models for Next-Generation Logic and Memory Technologies|
Enhanced TCAD Sentaurus Models to Speed Process Development for 14-nm Node and Beyond
|Mar 16, 2011||ITRI Adopts Synopsys' TCAD Sentaurus for Silicon Carbide Technology Development|
The Industrial Technology Research Institute of Taiwan (ITRI) has adopted Synopsys' TCAD Sentaurus simulation software to support its research and development of silicon carbide (SiC) semiconductor devices. TCAD Sentaurus' accurate modeling enables ITRI to speed up the development of SiC power devices with detailed simulations of their electrical and thermal behavior.
|Feb 10, 2011||Synopsys and Varian Collaborate on Process Models for Advanced Logic and Memory Technologies|
Synopsys and Varian Semiconductor Equipment Associates today announced a collaboration to develop Technology CAD (TCAD) models for cryogenic ion implantation.
|Mar 09, 2010||Imec and Synopsys Collaborate on 3D Stacked IC Development|
Synopsys, Inc. and the Belgian nanoelectronics research center, imec, today announced they have entered into a collaboration to use Synopsys TCAD finite-element method tools for characterizing and optimizing the reliability and electrical performance of through-silicon vias (TSVs). The collaboration will accelerate the development of 3D stacked IC technologies.
|Oct 06, 2009||Synopsys' Sentaurus TCAD Used to Simulate Solar Cell Performance Characteristics at NREL|
Synopsys, Inc. today announced that the U.S. Department of Energy's National Renewable Energy Laboratory (NREL), a leading government laboratory pursuing research in photovoltaic devices, has adopted Synopsys' Sentaurus TCAD for simulating solar cell characteristics to improve performance.
|May 27, 2009||TriQuint Semiconductor Selects Synopsys' TCAD Sentaurus for Compound Semiconductor Technology Development|
Synopsys, Inc. today announced that TriQuint Semiconductor has adopted Synopsys' TCAD Sentaurus device simulation software to support its research and development of high-frequency and high-power semiconductor devices targeting mobile handsets, 3G and 4G base stations, Wi-Fi, WiMAX, and defense and aerospace applications.
|Apr 01, 2009||Solar Energy Research Institute of Singapore Adopts Synopsys' Sentaurus TCAD for Solar Cell Research|
Synopsys, Inc., today announced that the Solar Energy Research Institute of Singapore (SERIS) has adopted Synopsys' Sentaurus TCAD to support its solar cell research and development programs.
|Sep 10, 2008||Synopsys and Ovonyx Collaborate on TCAD Models for Phase Change Memory|
Ovonyx Inc. and Synopsys, Inc. today announced an agreement to work on the development of device simulation models for phase change memory (PCM) based on Ovonyx's PCM technology.
|Jul 15, 2008||Synopsys and Mattson Collaborate on Advanced TCAD Process Simulation of CMOS Technology|
Mattson Technology, Inc. and Synopsys, Inc. today announced a collaboration to offer calibrated process models for flash annealing equipment used on the 45-nanometer (nm) node and beyond.
|Jun 18, 2008||Synopsys' TCAD Sentaurus Enables Development of Kodak's New Image Sensor Products |
Synopsys, Inc. today announced that Kodak, a world leader in image sensor technology, has adopted Synopsys' TCAD Sentaurus™ simulation software to support its research and development of new image sensor products.
|Apr 23, 2008||Toshiba Adopts Synopsys Sentaurus TCAD Simulation for Development of Next-Generation Device Technologies |
Synopsys, Inc. today announced that Toshiba Semiconductor Company has adopted Synopsys' Sentaurus™ TCAD software for simulating etching and deposition in the development of next-generation devices.
|Jan 22, 2008||Synopsys and Acceleware Deliver Hardware Accelerated Solution for Design of Optoelectronic Devices |
Acceleware Corp. and Synopsys, Inc. today announced a new hardware solution that enables up to 20-times faster electromagnetic simulation of optoelectronic devices such as CMOS image sensors.
|Oct 16, 2006||Synopsys Unveils New Breed of DFM Products to Solve Process-Related Variation Issues at 45NM and Beyond|
Synopsys, Inc. today unveiled a new family of process-aware design-for-manufacturing (PA-DFM) products that analyze variability effects at the custom/analog design stage for 45-nanometer (nm) and smaller designs.
|Jun 13, 2006||Synopsys Delivers New Release of Sentaurus TCAD Tool Suite on Dual-Core Intel® Xeon® Processors|
Synopsys, Inc. today announced the availability of a new Sentaurus TCAD release that adds significant process and device modeling capabilities for accelerated development of advanced technologies.
|Oct 17, 2005||Synopsys Extends TCAD Leadership with the Introduction of Sentaurus |
Synopsys, Inc. (NASDAQ:SNPS), a world leader in semiconductor design software, today announced the availability of the new Sentaurus Technology CAD (TCAD) tool suite.