Overview
Yield and performance are the foremost concerns for device design in the semiconductor industry, and a clear understanding of their sensitivity to process parameters is key for better control. In this webcast we will discuss the complete TCAD methodology that addresses the considerable manufacturing challenges posed by rising technological complexity, increasing process variability and shrinking time-to-market windows. Using TCAD process and device simulations for typical CMOS technology as input, Process Compact Models (PCMs) are created to enable efficient analysis of complex and multivariate process-device relationships. PCMs can then be applied to enhance manufacturability and process control. TCAD simulations have been conventionally used for exploring new technologies and novel devices, as well as optimizing process and device performance. Now the concept of PCMs provides a fast and efficient way of extending TCAD into manufacturing. Please join us to learn more about this topic.

Who Should Attend?
Process and device engineers working with technology development, design and process development engineers, and fab engineers and managers concerned with yield management through process parameter control.

View the Recording