Events 

2010 April
Photomask Japan
Photomask Japan is the 17th international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends.
Yokohama, Japan
Apr 13-15, 2010

2010 July
SEMICON West 2010
SEMICON West is the premier event for the display of new products and technologies for microelectronics design and manufacturing, featuring technologies from across the microelectronics supply chain, from electronic design automation, to device fabrication (wafer processing), to final manufacturing (assembly, packaging, and test). Visit Synopsys at booth #721 to see the latest on Yield Explorer, Synopsys' design-centric yield management tool and Sentaurus TCAD for solar cell simulation.
San Francisco, CA
Jul 13-15, 2010

2010 September
SPIE Photomask Technology
The annual SPIE/BACUS Symposium is the premier event for the photomask industry. Visit Synopsys at SPIE Photomask to learn the latest on Synopsys' mask synthesis and mask data prep solutions.
Monterey, CA
Sep 13-17, 2010