Synopsys at SPIE Advanced Lithography 2014 

 

Accelerating Innovation
February 23 - 27, San Jose Convention Center and San Jose Marriott Hotel


Synopsys Technical Forum
Monday, February 24
12:30 PM to 3:30 PM

Burn LinKeynote: Burn Lin, TSMC
Limits of Lithography Beyond the 10nm Node
Frank AbboudFrank Abboud, Intel
Mask Data Processing in the Era of Multibeam Writers
Howard KoHoward Ko, Synopsys
Industry Trends & Challenges
Jim ShielyJim Shiely, Synopsys
Virtually Rigorous: Exploiting Rigorous Lithography Simulation in Full-chip Mask Synthesis Flows

Please join us for our 2014 Technical Forum to learn the latest on Synopsys Manufacturing's mask synthesis, mask data prep and lithography simulation solutions. The Tech Forum is peer-to-peer, giving you the opportunity to hear how your lithography colleagues have addressed the challenges of 20nm and beyond. Plus, don’t miss the keynote presentation by Burn Lin of TSMC (registration required).

Agenda

TimePresentation TitleSpeakerCompany
12:30Registration & Lunch
1:00Industry Trends & ChallengesHoward KoSynopsys
1:20Virtually Rigorous: Exploiting Rigorous Lithography Simulation in Full-chip Mask Synthesis FlowsJim ShielySynopsys
1:50Break & Prize Drawing #1
2:00Mask Data Processing in the Era of Multibeam WritersFrank AbboudIntel
2:40Keynote: Limits of Lithography Beyond the 10nm NodeBurn LinTSMC
3:20Thank You & Prize Drawing #2Tom FerrySynopsys

Location
San Jose Marriott
Salon V & VI
301 South Market Street
San Jose, CA 95113
Directions

Register Today!


Exhibit Dates and Hours – Synopsys Booth #222

Tuesday, February 25: 10:00 am - 5:00 pm
6:00 pm - 8:00 pm (Poster Session)
Wednesday, February 26: 10:00 am - 4:00 pm

Location
San Jose Convention Center
San Jose, California
Booth #222
Directions

Overview
Synopsys provides industry-proven EDA solutions to meet the demands of today’s advanced IC manufacturing processes while setting the standard in platform flexibility to enable innovative and custom solutions for next-generation technology nodes. Synopsys’ comprehensive Mask Synthesis, Mask Data Preparation, TCAD, and Yield Management tools provide leading edge performance, accuracy, quality, and cost of ownership for all your production and development needs.

Synopsys Technical Program
Please click here to see the full list of Synopsys paper presentations at SPIE Advanced Lithography 2014.

Schedule a Meeting
If you are planning to attend SPIE Advanced Lithography and would like to schedule an onsite meeting with the Synopsys Manufacturing team, please send an email to manufacturing@synopsys.com with your full name, business title, company name, phone number, and the subject you’d like to discuss.