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Thank you for attending SPIE Advanced Lithography and the Synopsys Technical Forum. If you missed the Synopsys papers and presentations, or want to review them again, please download them below. Registration is required for all downloads. Synopsys Technical Forum Presentations
Synopsys Technical Program Papers The presentations below are available to download now. We will be adding more as they become available.  Source-mask optimization incorporating manufacturability constraints - Nikon Lithovision Paper
Author(s): Thomas Mülders, Synopsys GmbH (Germany); Vitaliy Domnenko, Synopsys, Inc. (Russian Federation); Bernd Küchler, Hans-Jürgen Stock, Synopsys GmbH (Germany)
Proc. SPIE 8326, 83260G (2012) - Achieving first-time-right mask layouts
Author(s): Bernd Küchler, Synopsys GmbH (Germany); Artem Shamsuarov, SAMSUNG Electronics Co., Ltd. (Korea, Republic of); Thomas Mülders, Ulrich Klostermann, Synopsys GmbH (Germany); Seung-Hune Yang, Seongho Moon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of); Vitaliy Domnenko, Synopsys, Inc. (Russian Federation); Sung-Woon Park, Synopsys Korea Inc. (Korea, Republic of) - Binary modeling method to check the sub-resolution assist features (SRAFs) probability
Author(s): Jianliang Li, Synopsys, Inc. (United States); Weimin Gao, Synopsys GmbH (Belgium); Yongfa Fan, Jing Xue, Qiliang Yan, Kevin Lucas, Lawrence S. Melvin III, Synopsys, Inc. (United States)
Proc. SPIE 8326, 83261D (2012) - Calibration and verification of a stochastic model for EUV resist
Author(s): Weimin Gao, Synopsys GmbH (Belgium); Joachim Siebert, Ulrich Klostermann, Alexander Philippou, Synopsys GmbH (Germany); Vicky Philipsen, Eric Hendrickx, IMEC (Belgium) - Computational lithography work flows and design rule exploration automation
Author(s): Sethi S. Satyendra, William A. Stanton, Jay A. Hiserote, Kevin Lucas, Synopsys, Inc. (United States) - Edge placement error reduction and ringing effect suppression using model-based targeting techniques
Author(s): Christopher M. Cork, Synopsys SARL (France); Xiaohai Li, Stephen Jang, Synopsys, Inc. (United States) - Implications of triple patterning for 14 nm node design and patterning
Author(s): Kevin Lucas, Synopsys, Inc. (United States)
Proc. SPIE 8327, 832703 (2012) - Pattern selection in high-dimensional parameter spaces
Author(s): Georg A. Viehoever, Hans-Jürgen Stock, Synopsys GmbH (Germany)
Proc. SPIE 8326, 832618 (2012) - Resist loss in 3D compact modeling
Author(s): Xin Zheng, Jensheng H. Huang, Fook Chin, Aram Kazarian, Synopsys, Inc. (United States); Chun-Chieh Kuo, Synopsys Taiwan Ltd. (Taiwan)
Proc. SPIE 8326, 83261C (2012)
Copyright 2012 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
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