Mask Synthesis and Data Prep 

Design-to-Mask Manufacturing Excellence 

Proteus products provide a comprehensive and powerful environment for performing full-chip proximity correction, building models for correction, and analyzing proximity effects on corrected and uncorrected IC layout patterns. Proteus products are the mask synthesis tool of choice for leading-edge IDM‘s and foundries. 

CATS mask data preparation (MDP) software for semiconductor, TFT, HDD, MEMS and photonics mask and direct write equipment data preparation, is a highly scalable, easy to use, feature-rich product suite which provides data prep modules for data fracture, data verification, MRC, PEC, jobdeck processing, layer operations, and data sizing. CATS provides mask tapeout teams with a seamless extension to Proteus.

  • Tools
 
  • Proteus
  • Full chip mask synthesis products (OPC, MBAF, ProGenPLUS) more

 
Proteus Progen, and Prospector form a comprehensive and powerful environment for performing full-chip proximity correction, building models for correction, and analyzing proximity effects on corrected and uncorrected IC layout patterns.
DOWNLOAD DATASHEET


 
Proteus MetroKit is a toolset designed to facilitate and automate the process of interfacing with metrology tools, thereby minimizing tool downtime and maximizing engineering efficiency.
PDF DOWNLOAD DATASHEET

  • SiVL
  • Highly-programmable lithography verification application more

 
SiVL® is a market leading silicon vs. layout (SVL) verification tool that compares a target design to its simulated silicon image to verify that a design is manufacturable.
DOWNLOAD DATASHEET


 
Alt-PSM technology for tighter control of chip performanceand increased yield.
DOWNLOAD DATASHEET


 
IC WorkBench Plus (ICWB+) is a powerful, hierarchical layout visualization and analysis tool with GDSII/OASIS viewing and editing and high-speed lithography simulation and analysis.
DOWNLOAD DATASHEET

  • CATS
  • Minimizes turnaround time, maximizes the quality of today's high-end masksmore

 
CATS™ is the most advanced and fully featured data preparation software available for semiconductor photomask manufacturing.
DOWNLOAD DATASHEET