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All Synopsys News

Feb 09, 2012CSR Selects Synopsys for Advanced-Node SoC Design
Adoption of Synopsys Galaxy Platform Driven by Superior Results for ARM CPU-based SoCs

Sep 22, 2008Synopsys Enters Mixed-Signal Implementation Market With Galaxy Custom Designer
Synopsys, Inc. (NASDAQ: SNPS), a world leader in software and IP for semiconductor design and manufacturing, today unveiled its Galaxy Custom Designer™ solution, the industry's first modern-era mixed-signal implementation solution. Architected for productivity, Galaxy Custom Designer leverages Synopsys' Galaxy™ Design Platform to provide a unified solution for custom and digital designs, thereby enhancing designer efficiency.

Jun 03, 2008MediaTek Achieves Faster Time-to-Tapeout Utilizing Smart Hierarchical Modeling in Synopsys IC Compiler
Synopsys, Inc. (NASDAQ: SNPS), a world leader in software and IP for semiconductor design and manufacturing, today announced that MediaTek, Inc., a leading semiconductor company for wireless communications and digital media solutions, has adopted Synopsys' IC Compiler for its next-generation, high-performance 65-nanometer (nm) system-on-chip (SoC) designs. IC Compiler was recently used to complete a hierarchical chip design that contained 4.5-million instances running at 700 megahertz (MHz).

May 14, 2008Synopsys and TSMC Collaborate on Advanced HSPICE Modeling Technology for 40-nm Processes
Synopsys, Inc. (NASDAQ: SNPS), a world leader in software and IP for semiconductor design and manufacturing today announced the release of the TSMC Modeling Interface (TMI) methodology, which has been developed from Synopsys' production-proven protocol for integrating custom device models into HSPICE®, HSIM™ and NanoSim® transistor-level circuit simulators

Mar 10, 2008Synopsys Announces Multi-Core Initiative to Accelerate Design Time-To-Results
Synopsys, Inc. (NASDAQ: SNPS), a world leader in software and IP for semiconductor design and manufacturing, today announced its multi-core initiative to deploy advanced parallel, threaded and other optimized compute technologies across its Discovery™ Verification and Galaxy™ Design platforms, and Design for Manufacturing (DFM) solutions.

Feb 25, 2008Synopsys Introduces the Eclypse Low Power Solution
Synopsys, Inc. (NASDAQ: SNPS), a world leader in software and IP for semiconductor design and manufacturing, today announced the Synopsys Eclypse™ Low Power Solution, the industry's most comprehensive suite of proven system-level, verification, implementation and signoff tools, intellectual property (IP), methodologies and services for low power chip development.

Sep 18, 2007Nikon and Synopsys Announce Manufacturing-Aware DFM Solution for 45 nm and Below
Nikon Corporation, a leading supplier of lithography equipment for microelectronics manufacturing, and Synopsys, Inc. (NASDAQ: SNPS), a world leader in semiconductor design and manufacturing software, today announced that Nikon's proprietary optical lithography exposure tool data is available for the latest release of the Synopsys Proteus optical proximity correction (OPC) software.

Jun 19, 2007Synopsys Announces Virtual Platform for Marvell'sPXA3xx Application Processors
Synopsys, Inc. (NASDAQ: SNPS), a world leader in semiconductor design software, today announced the availability of the DesignWare® VPXA3 Virtual Platform for development of smartphones, hand-held and consumer electronics devices that use Marvell PXA3xx XScale technology next-generation application processor.

Mar 01, 2007Yield Analysis and Optimization Ensures
As chip technology grows ever more sophisticated, new materials and manufacturing techniques create yield challenges that were unimagined in the early days of the IC.

Oct 16, 2006Synopsys Unveils New Breed of DFM Products to Solve Process-Related Variation Issues at 45nm and Beyond
Synopsys, Inc. (Nasdaq:SNPS), a world leader in semiconductor design software, today unveiled a new family of process-aware design-for-manufacturing (PA-DFM) products that analyze variability effects at the custom/analog design stage for 45-nanometer (nm) and smaller designs.