News 

All Synopsys News

Sep 22, 2008Synopsys Enters Mixed-Signal Implementation Market with Galaxy Custom Designer
Synopsys, Inc. (NASDAQ: SNPS), a world leader in software and IP for semiconductor design and manufacturing, today unveiled its Galaxy Custom Designer™ solution.

Jun 03, 2008MediaTek Achieves Faster Time-to-Tapeout Utilizing Smart Hierarchical Modeling
Synopsys, Inc. (NASDAQ: SNPS), a world leader in software and IP for semiconductor design and manufacturing, today announced that MediaTek, Inc., a leading semiconductor company for wireless communications and digital media solutions, has adopted Synopsys' IC Compiler for its next-generation, high-performance 65-nanometer (nm) system-on-chip (SoC) designs.

May 14, 2008Synopsys & TSMC Collaborate on Advanced HSPICE Modeling Technology
Synopsys, Inc. (NASDAQ: SNPS), a world leader in software and IP for semiconductor design and manufacturing today announced the release of the TSMC Modeling Interface (TMI) methodology, which has been developed from Synopsys' production-proven protocol for integrating custom device models

Mar 10, 2008Synopsys Announces Multi-Core Initiative to Accelerate Design Time-To-Result
Synopsys, Inc. (NASDAQ: SNPS), a world leader in software and IP for semiconductor design and manufacturing, today announced its multi-core initiative to deploy advanced parallel, threaded and other optimized compute technologies across its Discovery™ Verification and Galaxy™ Design platforms, and Design for Manufacturing (DFM) solutions.

Sep 18, 2007Nikon and Synopsys Announce Manufacturing-Aware DFM Solution
Nikon Corporation, a leading supplier of lithography equipment for microelectronics manufacturing, and Synopsys, Inc. (NASDAQ: SNPS), a world leader in semiconductor design and manufacturing software, today announced that Nikon's proprietary optical lithography exposure tool data is available for the latest release of the Synopsys Proteus optical proximity correction (OPC) software.

Mar 01, 2007Yield Analysis and Optimization Ensures Tight Design-to-Manufacturing Links
As chip technology grows ever more sophisticated, new materials and manufacturing techniques create yield challenges that were unimagined in the early days of the IC. Effective production of semiconductors at very deep-submicron geometries thus requires maintaining a careful balance between design and manufacturing.

Oct 16, 2006Synopsys Unveils New Breed of DFM Products to Solve Process-Related Variation Issues at 45NM and Beyond
Synopsys, Inc. (Nasdaq:SNPS), a world leader in semiconductor design software, today unveiled a new family of process-aware design-for-manufacturing (PA-DFM) products that analyze variability effects at the custom/analog design stage for 45-nanometer (nm) and smaller designs.